A PHOTOLITHOGRAPHY PROCESS DESIGN FOR 5 NM LOGIC PROCESS FLOW

A Photolithography Process Design for 5 nm Logic Process Flow

With the introduction of EUV lithography, the photolithographic process in 5 nm logic process can be simplified to use mostly single exposure method.In a typical 5 nm logic process, the contact-poly pitch (CPP) is 44-50 nm, the minimum metal pitch (MPP) is around 30-32 nm.And the overlay budget is estimated to be 2.5 nm (on product overlay).Althoug

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Combining Lovastatin and Minocycline for the Treatment of Fragile X Syndrome: Results From the LovaMiX Clinical Trial

Background: Limited success of previous clinical trials for Fragile X syndrome (FXS) has led researchers to consider combining different drugs FRENCH ÉPICERIE to correct the pleiotropic consequences caused by the absence of the Fragile X mental retardation protein (FMRP).Here, we report the results of the LovaMiX clinical trial, the first trial fo

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